Appeal No. 2001-0107
Application No. 09/143,505
reticle in the optical path external to the workpiece chamber.
(Id. at col. 10, ll. 12–26.) As for lasers, Noguchi teaches that
excimer lasers, including xenon chloride lasers, are suitable.
(Id. at col. 8, ll. 4–7.) According to Noguchi, a principal
object of the invention is to treat a large area, greater than
about 10 cm2 by a single shot. (Id. at col. 3, ll. 2–4, and
14–17.) Single-shot annealing of 6×6 cm2 areas are reported,
e.g., in Example 1. (Id. at col. 19, ll. 30–40.)
Kondo
Kondo relates to a process of patterning photosensitive
glass by patterned exposure to light followed by etching. More
particularly, Kondo teaches a method that facilitates control
over the etch depth, minimization of surface roughness, and,
particularly for single-sided etching, a way to eliminate the
need to attach protective tape to one side of the photosensitive
glass. (Kondo at col. 2, ll. 5–22.) With reference to Figure 1,
Kondo teaches that a photosensitive glass 10 is exposed to laser
light through an exposure mask 2, which is patterned with shaded
areas 2b that block the laser light from the glass surface.
(Kondo at col. 4, ll. 34–45.) After further laser exposure to
define layer depths (id. at l. 61 to col. 5, l. 6), the glass is
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