Appeal No. 2001-1092
Application No. 09/169,490
APPENDIX
42. A method of depositing a coating having an
infrared reflecting film comprising the steps of:
providing a cathode defined as a first
cathode which when sputtered in a non-reactive
atmosphere deposits an infrared reflecting film
having the possibility of two levels of
resistivity, one level of resistivity higher than
the other level of resistivity, the resistivity
having a higher level provides an emissivity
higher than the emissivity provided by the lower
level of resistivity;
sputtering a metal cathode defined as a
second cathode in an atmosphere having sufficient
reactive gas to deposit a metal oxide film over a
surface of a substrate, the metal oxide film
having preferential crystal growth orientation to
provide the infrared reflecting film having the
lower level of resistivity, and
sputtering the first cathode in a non-reactive
atmosphere to deposit an infrared reflecting metal
film on the metal oxide film wherein the reflecting
metal film deposited on the metal oxide film has
the lower level of resistivity to provide a low
emissivity coated article.
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