Appeal No. 1998-2401
Application 08/286,106
to one of ordinary skill in the art. See In re Rinehart, 531
F.2d 1048, 1051, 189 USPQ 143, 147 (CCPA 1976).
I. The 35 U.S.C. § 103 rejection of claims 1, 4-7, 10-12 and
17-19 over Ehrlich and Jelks
The examiner states that it would have been obvious to one
having ordinary skill in the art to use the build-up layer
pattern disclosed in Ehrlich, as an etch mask, because Jelks
teaches that metal etch mask patterns can be formed by direct
writing, and Ehrlich’s method is one such direct writing method.
(answer, page 4).
The examiner further states that it would have been obvious
to have substituted Ehrlich’s method of direct writing in the
method of Jelks, and Ehrlich’s method offers the advantages of
maskless film growth (these advantages being that Ehrlich’s
method allows the separation of the delineation phase of the
film formation from the growth phase, and, as a result, to use
separate sources for production of the atom flux in the two
phases). (answer, pages 4-5).
The examiner emphasizes that Ehrlich can be used in
combination with Jelks for teaching another method of forming
build-up layer etch masks. (answer, page 10). The examiner
further emphasizes that Jelks and Ehrlich have in common the
fact that they both form build-up layers. (answer, page 10).
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