Appeal No. 2000-1003
Application No. 08/631,465
23. An apparatus for depositing film, said apparatus
comprising:
a deposition chamber being adapted to hold a source of
target particles and a substrate for receiving said
target particles;
a plasma generator for initially ionizing said target
particles;
a first secondary optical ionizer fo creating a first plane
of optical energy positioned to overlie said substrate,
said first plane of optical energy ionizing target
particles passing through said first plane to said
substrate; and
a second secondary optical ionizer for creating a second
plane of optical energy positioned to overlie said
substrate, said second plane of optical energy ionizing
target particles passing through said second plane to
said substrate.
34. An apparatus for depositing film, said apparatus
comprising:
a deposition chamber being adapted to hold a source of
target particles and a substrate for receiving said
target particles;
a plasma generator for initially ionizing said target
particles;
a secondary ionizer for creating a secondary ionization zone
between said source and said substrate, said secondary
ionization zone promoting ionization of said target
particles prior to reaching said substrate; and
an electrostatic collimator grid positioned between said
secondary ionization zone and said substrate, said
electrostatic collimator grid directing said target
particles toward said substrate.
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