The opinion in support of the decision being entered today was not written
for publication and is not binding precedent of the Board.
Paper No. 17
UNITED STATES PATENT AND TRADEMARK OFFICE
____________
BEFORE THE BOARD OF PATENT APPEALS
AND INTERFERENCES
____________
Ex parte NICK KEPLER, OLOV KARLSSON, LARRY WANG,
BASAB BANDYOPAHYAY, EFFIONG IBOK
and CHRISTOPHER F. LYONS
____________
Appeal No. 2001-0482
Application No. 09/186,078
____________
ON BRIEF
____________
Before HAIRSTON, RUGGIERO, and BARRY, Administrative Patent Judges.
RUGGIERO, Administrative Patent Judge.
DECISION ON APPEAL
This is a decision on the appeal from the final rejection of claims 1-35. Claims 36-44 have
been withdrawn from consideration as being directed to a non-elected invention.
The claimed invention relates to a method of manufacturing a semiconductor device having
an insulated trench in which impurities are ion implanted proximate to the edges of the trench.
According to Appellants (specification, pages 3-5), the thickness of the oxide at the trench edges is
increased due to the enhanced oxidation rate provided by the implanted impurities.
Claim 1 is illustrative of the invention and reads as follows:
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