Appeal No. 2001-0769 Application No. 09/237,791 b) positioning said substrate fixture in a vapor deposition chamber having a vapor generator, said substrate fixture being positioned at an oblique angle to said vapor generator; c) introducing phosphor constituents into said vapor generator capable of forming a vapor of said phosphor constituents; d) placing said chamber under an inert atmosphere; e) activating said vapor generator to form an ingot pool of said phosphor constituents and thereby generate said vapor of said phosphor constituents; f) directing said vapor of said phosphor constituents towards said substrate fixture; g) maintaining a constant height of said ingot pool of said phosphor constituents in said vapor generator; and h) rotating said substrate fixture for a time sufficient to effect deposition of a phosphor complex on said imaging screen substrate to thereby form said anisotropic, auto- collimating imaging screen. PRIOR ART In support of his rejections, the examiner relies on the following prior art references: Blecherman et al. (Blecherman) 3,889,019 Jun. 10, 1975 Brixner et al. (Brixner) 5,380,599 Jan. 10, 1995 Goodman et al. (Goodman) 5,427,817 Jun. 27, 1995 REJECTION 2Page: Previous 1 2 3 4 5 6 NextLast modified: November 3, 2007