Ex Parte GOODMAN et al - Page 3




               Appeal No. 2001-0769                                                                                                
               Application No. 09/237,791                                                                                          



                       The appealed claims stand rejected as follows:                                                              
               1)      Claims 30, 31, 35 through 39 and 41 under 35 U.S.C. § 103 as unpatentable over the                          
                       combined disclosures of Goodman and Blecherman; and                                                         
               2)      Claims 32 through 34 under 35 U.S.C. § 103 as unpatentable over the combined disclosures                    
                       of Goodman, Blecherman and Brixner.                                                                         
                                                             OPINION                                                               
                       We have carefully reviewed the claims, specification and prior art, including all of the                    
               evidence and arguments advanced by both the examiner and appellants in support of their respective                  
               positions.  This review leads us to conclude that the examiner’s Section 103 rejections are not well                
               founded.  Accordingly, we will not sustain the examiner’s Section 103 rejections for essentially                    
               those reasons set forth in the Brief.  We add the following primarily for emphasis.                                 
                       The claimed subject matter is directed to a vapor deposition process for forming an                         
               anisotropic, auto-collimating imaging screen.  See claim 30.  This vapor deposition process requires,               
               inter alia, positioning a substrate fixture (32) at an oblique angle to the exit port (21) of a vapor               
               generator (15).  See claim 30 together with the specification, page 4, lines 1-7 and Figure 1.  By                  
               positioning the substrate fixture in this manner, substrates (34) are placed at an oblique angle to the             
               exit port (21) of the vapor generator (15) during the entire vapor deposition process.  See, e.g., the              
               Brief, page 7 and Figure 1.  This arrangement, according to page 4, lines 1-7, of the specification, is             
               said to improve “uniformity of the coating thickness.”                                                              

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