Appeal No. 2001-1068
Application 09/063,196
on the surfaces to stabilize to form a non-
volatile film over which further unstable
volatile compounds will be deposited when
plasma enhanced chemical vapor deposition is
repeated.
The references relied on by the examiner are:
Albrecht 5,109,562 May 5, 1992
Eichman et al. (Eichman) 5,271,963 Dec. 21, 1993
Shufflebotham et al.(Shufflebotham) 5,503,676 Apr. 2, 1996
Foster et al. (Foster) 5,716,870 Feb. 10, 1998
Mizuno et al. (Mizuno) 5,728,629 Mar. 17, 1998
Miyamoto 5,840,628 Nov. 24, 1998
(filed June 13, 1995)
Wolf, “Silicon Processing for the VLSI Era,” Lattice Press,
vol. 2, 1990, pp. 166, 167, 273 and 274.
Claims 1 through 3, 11 and 29 stand rejected under
35 U.S.C. § 103(a) as being unpatentable over Mizuno in view of
Miyamoto.
Claims 4 through 6 stand rejected under 35 U.S.C.
§ 103(a) as being unpatentable over Mizuno in view of Miyamoto
and Wolf.
Claims 7, 24, 25, 27 and 28 stand rejected under
35 U.S.C. § 103(a) as being unpatentable over Mizuno in view of
Miyamoto, Wolf and Foster.
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