Appeal No. 2001-1384
Application No. 08/726,229
(Japanese Patent Application)
Morimoto et al. JP 1-119049 May 11, 1989
Watanabe et al. “A New Cylindrical Capacitor Using Hemispherical
Grained Si (HSG-SI) for 256Mb DRAMs” IDEM 92, 1992, IEEE pp. 259-
262. (Watanabe)
Additionally, the examiner relies on admitted prior art
[APA], as described at page 11 of the specification.
Claims 1-13 stand rejected under 35 U.S.C. 103. As evidence
of obviousness, the examiner cites Ahn or Cathey in view of APA,
Jun, Morimoto, Watanabe and Kavassalis.
Reference is made to the briefs and answer for the
respective positions of appellants and the examiner.
OPINION
It is the examiner’s position that either one of Cathey,
Morimoto or Ahn discloses the deposition of a particle colloidal
solution evenly on a lower electrode, forming a micro-villus
pattern by using the particles as a mask, removing the particles,
and forming a capacitor dielectric layer and top electrode. The
examiner also notes that APA teaches the formation of silica
particles in the solution to form a microemulsion, that Jun
-3–
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