Ex Parte CAREY et al - Page 2




               Appeal No. 2001-2042                                                                                               
               Application No. 09/025,006                                                                                         
                                               APPEALED SUBJECT MATTER                                                            
                      The subject matter on appeal is directed toward a thin film transistor on a low-                            
               temperature plastic substrate.  Details of the appealed subject matter are provided in                             
               representative claim 17 below:                                                                                     
                      17.  A thin film transistor, consisting of:                                                                 
                      a substrate composed of low-temperature plastic,                                                            
                      said low-temperature plastic substrate being not capable of withstanding sustained                          
               processing temperatures greater than about 2500C,                                                                  
                      an insulating layer of SiO2 on the plastic,                                                                 
                      a layer of silicon on the insulating SiO2 layer, said layer of silicon being composed of                    
               sections of doped silicon and undoped silicon,                                                                     
                      said layer of silicon including sections of poly-silicon,                                                   
                      a gate dielectric layer of SiO2 on at least a section of the layer of silicon,                              
                      a layer of gate metal on at least a section of the gate dielectric layer of SiO2,                           
                      a layer of oxide on sections of said layer of silicon and said layer of gate metal, and                     
                      metal contacts on sections of said layer of silicon and said layer of gate metal, defining                  
               source, gate, and drain contacts and interconnects.                                                                
                                                                                                                                 
                                                          PRIOR ART                                                               
                      The examiner relies on the following prior art references:                                                  
               Kaschmitter et al. (Kaschmitter)      5,346,850                      Sep. 13, 1994                                 
               Kwo                                   5,523,587                      Jun.    4, 1996                               
                      The appellants’ admission at page 9 of the specification (hereinafter referred to as                        
               “admitted prior art”).                                                                                             




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