Ex Parte Ko et al - Page 1



                   The opinion in support of the decision being entered                
                       today was not written for publication and                       
                          is not binding precedent of the Board.                       
                                                             Paper No. 18              
                      UNITED STATES PATENT AND TRADEMARK OFFICE                        
                                   _______________                                     
                          BEFORE THE BOARD OF PATENT APPEALS                           
                                  AND INTERFERENCES                                    
                                   _______________                                     
                   Ex parte KEI-YU KO, LI LI AND GUY T. BLALOCK,                       
                                   _______________                                     
                                 Appeal No. 2002-0702                                  
                              Application No. 09/711,324                               
                                   _______________                                     
                                       ON BRIEF                                        
                                   _______________                                     
          Before KIMLIN, GARRIS and OWENS, Administrative Patent Judges.               
          GARRIS, Administrative Patent Judge.                                         

                                  DECISION ON APPEAL                                   
               This is a decision on an appeal which involves claims 1-38.             
          These are all of the claims in the application.                              
               The subject matter on appeal relates to a dry etchant                   
          comprising a component having a particular general formula,                  
          wherein the dry etchant is formulated to etch doped silicon                  
          dioxide with a selectivity over (e.g., at a faster rate than)                
                                          1                                            




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