The opinion in support of the decision being entered today was not written
for publication and is not binding precedent of the Board.
Paper No. 20
UNITED STATES PATENT AND TRADEMARK OFFICE
____________
BEFORE THE BOARD OF PATENT APPEALS
AND INTERFERENCES
____________
Ex parte MING JANG HWANG, KEIZO HOSODA,
SHINTARO AOYAMA, TADASHI TERASAKI and TSUYOSHI TAMARU
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Appeal No. 2002-1178
Application No. 09/354,459
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ON BRIEF
____________
Before HAIRSTON, GROSS, and BARRY, Administrative Patent Judges.
HAIRSTON, Administrative Patent Judge.
DECISION ON APPEAL
This is an appeal of claims 1 through 4, 6 through 8 and 21 through 28.
The disclosed invention relates to a method of reducing by-product deposition inside a wafer
processing chamber by introducing a heated gas into the chamber concurrently with the introduction
of reactant gases into the chamber to maintain the inner wall of the chamber at a temperature
sufficiently high to maintain a reaction product formed by the reactant gases in a gaseous phase of
the sublimation curve for the reaction product when contacting the inner wall.
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