Appeal No. 2002-1330
Application No. 09/178,249
“if rewritten in independent form including all of the
limitations of the base claim and any intervening claims.”
(Final Office action, page 4.)
The subject matter on appeal relates to a dielectric layer
fabrication method. Further details of this appealed subject
matter are recited in representative claims 1 and 5 reproduced
below:
1. A dielectric layer fabrication method,
comprising the steps of:
(a) applying a layer of dielectric precursor on
a body;
(b) flowing a precursor reaction catalyst over
said layer; and
(c) completing a precursor reaction to form a
dielectric layer.
5. The method of claim 1, wherein:
(a) said body of step (a) of claim 1 is within a
circular cylindrical chamber; and
(b) said flowing of step (b) of claim 1 is into
said chamber at the circular periphery of
said chamber, is radial over said precursor
layer to a central axis, and is out of said
chamber at said central axis.
The examiner relies on the following prior art references
as evidence of unpatentability:
Radhakrishnan 5,650,361 Jul. 22, 1997
Smith et al. 5,955,140 Sep. 21, 1999
(Smith) (filed Nov. 14, 1996)
2
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