Appeal No. 2002-1555 Page 2
Application No. 09/511,572
26. A gas dispersion apparatus for use in a reactor
comprising:
at least one gas source;
at least two gas dispersion elements positioned
proximate a filament array and a substrate, each said gas
dispersion element forming an independent discharged gas
zone directed at said substrate; and
each said gas dispersion element connected to said gas
source by a gas feedline wherein gas flow can be
independently controlled to each said gas dispersion element
and gas zone formed thereby.
The prior art references of record relied upon by the
examiner in rejecting the appealed claims are:
Fujiyama et al. (Fujiyama) 4,529,474 Jul. 16, 1985
Anthony et al. (Anthony) 4,970,986 Nov. 20, 1990
Fujii et al. (Fujii) 4,980,204 Dec. 25, 1990
Watabe 5,500,256 Mar. 19, 1996
Ni 6,200,387 Mar. 13, 2001
(filed Oct. 30, 1998)
Claims 26-29 stand rejected under 35 U.S.C. § 103 as being
unpatentable over Anthony in view of Ni or Fujii. Claims 30-33
stand rejected under 35 U.S.C. § 103 as being unpatentable over
Anthony in view of Ni or Fujii, and further in view of Fujiyama.
Claims 34-42 stand rejected under 35 U.S.C. § 103 as being
unpatentable over Anthony in view of Ni or Fujii and further in
view of Watabe.
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