Ex Parte GRANNEMAN et al - Page 5




          Appeal No. 2002-1760                                                        
          Serial No. 09/355,509                                                       
               The examiner does not compare the facts in Harza with those            
          in the present case and explain why, based upon this comparison,            
          the legal conclusion in the present case should be the same as              
          that in Harza.  Instead, the examiner relies upon Harza as                  
          establishing a per se rule that duplication of parts is obvious.            
          As stated by the Federal Circuit in In re Ochiai, 71 F.3d 1565,             
          1572, 37 USPQ2d 1127, 1133 (Fed. Cir. 1995), “reliance on per se            
          rules of obviousness is legally incorrect and must cease.”                  
               For a prima facie case of obviousness to be established, the           
          teachings from the prior art itself must appear to have suggested           
          the claimed subject matter to one of ordinary skill in the art.             
          See In re Rinehart, 531 F.2d 1048, 1051, 189 USPQ 143, 147 (CCPA            
          1976).  The mere fact that the prior art could be modified as               
          proposed by the examiner is not sufficient to establish a prima             
          facie case of obviousness.  See In re Fritch, 972 F.2d 1260,                
          1266, 23 USPQ2d 1780, 1783 (Fed. Cir. 1992).  The examiner must             
          explain why the prior art would have suggested to one of ordinary           
          skill in the art the desirability of the modification.  See                 
          Fritch, 972 F.2d at 1266, 23 USPQ2d at 1783-84.                             
               The examiner argues that one of ordinary skill in the art              
          would have included an additional reactor in Zinger’s processing            
          chamber to permit simultaneous heat treatment of wafers in two              


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