The opinion in support of the decision being entered today was
not written for publication and is not binding precedent of the
Board.
Paper No. 23
UNITED STATES PATENT AND TRADEMARK OFFICE
__________
BEFORE THE BOARD OF PATENT APPEALS
AND INTERFERENCES
__________
Ex parte PATRICK J. RYAN,
MICHAEL R. CONBOY
and STEPHEN P. HOVESTOL
__________
Appeal No. 2003-0931
Application 09/383,508
___________
ON BRIEF
___________
Before MCQUADE, NASE, and BAHR, Administrative Patent Judges.
Per curiam.
DECISION ON APPEAL
Patrick J. Ryan et al. appeal from the final rejection
(Paper No. 16) of claims 1 through 4, 6 through 12 and 19, all of
the claims pending in the application.
THE INVENTION
The invention relates to “a semiconductor fabrication
facility employing one or more reticle sorters” (specification,
page 1).1 Representative claims 1, 10 and 19 read as follows:
1 A reticle is a mask having clear and opaque features
corresponding to a pattern to be created in a photolithography
process (see page 1 in the specification).
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