Ex Parte LEE - Page 4





                          2. Lee is involved on the basis of application 09/449,762, filed 26 November 1999.                                         

                          3. Lee has been accorded benefit for the purpose of priority of application 09/192,153,                                    
                 filed 12 November 1998 and application 08/416,558, filed 4 April 1995.                                                              
                          4. Van Engelen real party in interest is ASML Netherlands, B.V.(Paper 9).                                                  
                          5. Lee real party in interest is Nikon Corporation (Paper 4).                                                              
                          6. Count 1, the sole count of the interference, is as follows:                                                             
                                                             Claim 4 of 09/449,762                                                                   
                                                                         or                                                                          
                                                             Claim 10 of 5,844,666                                                                   
                          7. Lee claim 4 is as follows:                                                                                              
                                A lithographic device with a machine frame which, seen parallel to a vertical Z                                      
                          direction, supports in that order a radiation source, a mask holder, a focusing system with                                
                          a main axis directed parallel to the Z-direction, and a substrate holder which is                                          
                          displaceable perpendicularly to the Z-direction by means of a positioning device, the                                      
                          positioning device of the substrate holder including an object table and a drive unit by                                   
                          which the object table is displaceable over a guide parallel to at least an X-direction,                                   
                          which guide is fastened to a first frame of the positioning device while a stationary part of                              
                          the drive unit is fastened to a second frame of the positioning device which is                                            
                          dynamically isolated from the first frame, wherein the first frame of the positioning                                      
                          device of the substrate holder belongs to the machine frame of the lithographic device,                                    
                          while the second frame of the positioning device of the substrate holder belongs to a force                                
                          frame of the lithographic device which is dynamically isolated from the machine frame;                                     
                          and wherein a reaction force exerted by the object table on the drive unit during operation                                
                          and arising from a driving force exerted by the drive unit on the object table is                                          
                          transmittable exclusively into the second frame.                                                                           

                          8. Claim 10 of van Engelen is as follows:                                                                                  

                                A lithographic device with a machine frame which, seen parallel to a vertical Z                                      
                          direction, supports in that order a radiation source, a mask holder, a focusing system with                                
                          a main axis directed parallel to the Z-direction, and a substrate holder which is                                          
                          displaceable perpendicularly to the Z-direction by means of a positioning device, the                                      
                          positioning device of the substrate holder, including an object table and a drive unit by                                  

                                                                        -4-                                                                          







Page:  Previous  1  2  3  4  5  6  7  8  9  10  11  12  13  14  15  Next 

Last modified: November 3, 2007