Appeal No. 2001-1821
Application 09/098,311
In the sentence bridging pages 4 and 5 of our decision, we
point out that Bartha discloses that his energy can be either low
frequency or 13.56 MHZ high frequency RF, and that Ravi teaches
that both single and mixed frequency RF are useful for generating
plasmas for substrate processing. In view of these disclosures,
one of ordinary skill in the art would have had a reasonable
expectation of success in using low frequency in combination with
high frequency to make Bartha’s silicon carbide. The motivation
for configuring Ravi’s system such that it is capable of making
silicon carbide using mixed frequency RF, and the reason why one
of ordinary skill in the art would have had a reasonable
expectation of success in doing so, are set forth on pages 3-6 of
our decision.
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