Appeal No. 2003-1162 Page 3
Application No. 09/468,292
Claims 1, 2, 46, 59, and 61 are further illustrative of the method on appeal:1
1. A method for vaporizing reactants for vapor deposition of a thin film on a substrate,
comprising:
providing an ionic liquid;
dissolving a precursor in the ionic liquid; and
passing a stream of gas through the ionic liquid.
2. The method of claim 1, further comprising heating the ionic liquid to a temperature
equal to about a volatilization point of the precursor.
46. The method of claim 1, wherein the ionic liquid is of the formula:
wherein R1 is alkyl and Y - comprises halides, sulfates, nitrates, acetates, nitrites,
tetrafluoroborates, tetrachloroborates, hexafluorophosphates, [SbF6]-, chloroaluminates,
bromoaluminates, chlorocuprates, heteropolyanionics, trifluoromethanesulfonates, or mixtures
thereof.
59. A method for vaporizing reactants for vapor deposition of a thin film on a substrate,
comprising:
providing an ionic liquid;
substantially dissolving at least one precursor in the ionic liquid; and
passing a stream of gas through the ionic liquid.
1Emphasis added in claims 46, 59, and 61.
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