Appeal No. 2003-1656
Application No. 09/725,973
infrared filter layer is formed as a planarizing layer not
contacting the substrate. The appealed subject matter
also relates to a method for fabricating the above discussed
optoelectronic microelectronic fabrication. This subject matter
is adequately represented by independent claim 1 which reads as
follows:
1. An optoelectronic microelectronic fabrication comprising:
a substrate having formed therein a minimum of one photoactive
region which is sensitive to infrared radiation;
a minimum of one microlens layer formed over the substrate
and in registration with the minimum of one photoactive region; and
a minimum of one infrared filter layer formed interposed
between the substrate and the minimum of one microlens layer,
wherein the minimum of one infrared filter layer is formed as
a planarizing layer not contacting the substrate.
The references relied upon by the Examiner as evidence of
obviousness are:
Oozu et al. (Oozu) 5,453,611 Sep. 26, 1995
Jedlicka et al. (Jedlicka) 5,604,362 Feb. 18, 1997
Chiulli et al. (Chiulli) 5,667, 920 Sep. 16, 1997
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