Ex Parte SCHOENFELD et al - Page 2



          Appeal No. 2004-0393                                                        
          Application 09/388,824                                                      
               This is a decision on appeal under 35 U.S.C. § 134(a) from             
          the final rejection of claims 53-60.                                        
               We affirm-in-part.                                                     

                                     BACKGROUND                                       
               The invention relates to a method of forming an integrated             
          circuit having conductive paths of different heights.                       
               Claim 53 is reproduced below.                                          
                    53.  A method for forming a memory circuit, comprising:           
                    forming a structure on a substrate, the structure                 
               including a first conductive layer disposed on the substrate           
               and a second conductive layer disposed on the first                    
               conductive layer;                                                      
                    removing the second conductive layer from a first                 
               region of the structure while preserving the second                    
               conductive layer in a second region of the structure;                  
                    forming digit lines from the first conductive layer in            
               the first region of the substrate in a direction normal to             
               the substrate; and                                                     
                    forming a high current line in a spaced parallel                  
               relationship with the digit lines, the high current line               
               being formed from the first and second conductive layers in            
               the second region of the substrate.                                    
               The examiner relies on the following reference:                        
               Jimenez             5,543,358          August 6, 1996                  


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