Ex Parte Williams et al - Page 2




          Appeal No. 2003-2169                                                        
          Application 09/792,667                                                      


          directional deposition (request, page 2).  The appellants rely              
          upon their figure 13E for a clear and enabling disclosure of how            
          the directional nature of the deposition is obtained.  See id.              
               What the appellants’ figure 13E shows is that the electric             
          field is pointed in the direction of deposition.  That figure,              
          however, as well as the remainder of the appellants’ disclosure,            
          does not disclose any particular technique for orienting the                
          electric field in the desired direction.  Instead, as pointed out           
          in our decision (page 5), the specification merely states that              
          plasma-enhanced chemical vapor deposition machines, which are               
          commercially available, preferably are used for the process, and            
          that the directional deposition also can be obtained by                     
          sputtering (page 20, lines 6-22).  As we pointed out in our                 
          decision, because these are the same techniques used by Agahi to            
          obtain directional deposition predominately on horizontal                   
          surfaces (col. 7, lines 52-58), “it reasonably appears that                 
          Agahi’s electric fields, like those of the appellants, are                  
          ‘oriented directionally’ as that term is used by the appellants”            
          (page 5).                                                                   
               As argued by the appellants, “[a] person of skill in the art           
          would know how to adjust the equipment to obtain the electric               
          field described in the above-quoted passage and in Fig. 13E”                

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