Appeal No. 2003-2169
Application 09/792,667
(request, page 2). Likewise, one of ordinary skill in the art
would have known how to adjust Agahi’s plasma-enhanced chemical
vapor deposition and sputtering equipment such that the electric
fields are oriented so as to provide Agahi’s directional
deposition predominately on horizontal surfaces (col. 7,
lines 52-58).
We have reconsidered our decision in response to the
appellants request but, for the above reasons, we decline to make
any change to the decision.
DENIED
)
TERRY J. OWENS )
Administrative Patent Judge )
)
)
) BOARD OF PATENT
PETER F. KRATZ )
Administrative Patent Judge ) APPEALS AND
)
) INTERFERENCES
)
CATHERINE TIMM )
Administrative Patent Judge )
TJO/ki
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