Appeal No. 2005-0453 Page 3
Application No. 09/893,866
12. In the fabrication of liquid crystal displays (LCDs), a method for depositing silicon
films with trace impurities, the method comprising:
supplying a substrate; and
sputter depositing silicon and a controlled amount of a first impurity on the substrate.
The Examiner maintains rejections over prior art and, as evidence of unpatentability, the
Examiner relies upon the following prior art documentation:
Zhang et al. (Zhang) 5,569,936 Oct. 29, 1996
Yamazaki et al. (Yamazaki) 6,306,694 Oct. 23, 2001
Admitted prior art, specification, p. 4, line 5
The specific rejections maintained by the Examiner are as follows:
1. Claims 1-3, 12, and 14 stand rejected under 35 U.S.C. § 102(b) as being anticipated by
Zhang.
2. Claims 4, 5, 11, 13, and 15-18 stand rejected under 35 U.S.C. § 103(a) as being
unpatentable over Zhang.
3. Claims 6, 8, 9, 19, 21, and 22 stand rejected under 35 U.S.C. § 103(a) as being
unpatentable over Zhang in view of Yamazaki.
4. Claims 7, 10, 20, and 23 stand rejected under 35 U.S.C. § 103(a) as being unpatentable
over Zhang in view of Yamazaki and further in view of the Admitted Prior Art.
Appellants state that claims 1-11 stand or fall together and that claims 12-23 stand or fall
together (Brief, p. 4). It appears from the arguments that the grouping is meant to apply to the
anticipation rejection. For the anticipation rejection, therefore, we will select claims 1 and 12 to
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