The opinion in support of the decision being entered today was not written for
publication and is not binding precedent of the Board.
UNITED STATES PATENT AND TRADEMARK OFFICE
____________
BEFORE THE BOARD OF PATENT APPEALS
AND INTERFERENCES
____________
Ex parte DAVID RUSSELL EVANS
____________
Appeal No. 2005-1220
Application No. 09/270,606
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ON BRIEF
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Before KIMLIN, WALTZ and KRATZ, Administrative Patent Judges.
KRATZ, Administrative Patent Judge.
DECISION ON APPEAL
This is a decision on appeal from the examiner's final
rejection of claims 1-20, which are all of the claims pending in
this application.
BACKGROUND
Appellant's invention relates to a chemical-mechanical
polishing (CMP) process. An understanding of the invention can
be derived from a reading of exemplary claims 1 and 13, which are
reproduced below.
1. An method of fabricating an integrated circuit
using CMP comprising:
providing a substrate with an overlying silicon
dioxide layer, and without any dummy structure;
forming a CMP slurry containing cerium oxide;
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