Appeal No. 2005-1894
Application No. 10/209,004
which claims the method for forming the electrode, is
illustrative:
2. A method for forming an electrode comprising:
forming an insulating layer;
forming a contact in said insulating layer;
forming an electrode layer on said insulating layer and
on said contact;
etching said electrode layer utilizing a dry etch; and
etching said electrode layer utilizing a wet etch to
form an electrode having a nodular shape.
THE REFERENCES
Sandhu et al. 5,381,302 Jan. 10, 1995
(Sandhu)
Hosaka2 62-115767 May 27, 1987
(Japanese Kokai)
THE REJECTION
Claims 2 and 4-11 stand rejected as being unpatentable over
Sandhu in view of Hosaka.
OPINION
We affirm the aforementioned rejection.
The appellant states that the claims stand or fall in three
groups: 1) claims 2, 4-6 and 10; 2) claims 7 and 9; and
2 Citations herein to Hosaka are to the English translation thereof
which is of record.
2
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