Appeal No. 2006-0216
Application No. 10/325,203
varying the voltage profile may occur prior to a process (e.g., see independent claim 22) or
during a series of processes (e.g., see independent claim 38). This appealed subject
matter is adequately represented by independent claims 22 and 38 which read as follows:
22. A method of operating a plasma chamber, comprising:
inputting at least one gas into a chamber;
energizing a coil located within a coupling distance of said gas with a waveform
having a voltage profile that is a function of the length of said coil; and
varying the voltage profile prior to a process to achieve a maximum coupling at a
desired point.
38. A method of operating a plasma chamber during a series of processes,
comprising:
inputting at least one gas into a chamber;
energizing a coil located within a coupling distance of said gas with a waveform
having a voltage profile that is a function of coil length and a first value of a circuit
parameter; and
energizing said coil with a waveform having a voltage profile that is a function of coil
length and a second value of said circuit parameter.
The references set forth below are relied upon by the examiner in the § 102 and §
103 rejections before us:
Holland et al. (Holland) 5,800,619 Sept. 1, 1998
(filed Jun. 10, 1996)
Collins et al. (Collins) 6,545,420 Apr. 8, 2003
(filed Jun. 6, 1995)
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