Appeal No. 2005-2666
Application No. 09/496,634
square.” See claim 10. We find that Kuhlman teaches and/or
would have suggested such features. See column 4, lines 19-57.
Specifically, Kuhlman teaches (column 4, lines 19-29):
The inner surface of outer sheet 11 carries a
transparent, electrically conductive, antireflection
layer 20. Layer 20 can be a monolithic construction or
it can itself be made up of more than one layer as is
shown in FIG. 2. In FIG. 2, 17 is the plastic
substrate and layer 20 is itself a three layer stack
which includes a transparent metal oxide layer 21, a
metal layer 22 and a second transparent oxide layer 24.
Layer 20 can also be a transparent antireflective
electrically conductive coating of conductive metal
oxide.
Kuhlman goes onto state (column 4, lines 37-57):
Typical examples of monolithic layer 20 include a
single indium-tin oxide layer . . . and the like.
Examples of the multilayer high index-low index layer
of 500 A to 2000A thickness including transparent
dielectric-metal-dielectric stacks wherein 21 and 24
are the dielectric layers and 22 is the metal layer . .
. . .
This layer 20, whether presented as a monolith or as a
multilayer stack, should have substantial electrical
conductance, i.e., less than 200 ohms per square . . .
As correctly found by the examiner (the Answer, page 7):
The appellant admits that the measured sheet resistance
of the outer layer is the same as the measure sheet
resistance of the stack (see page 6 of [the] Appeal
Brief). Therefore, when Kuhlman discloses that the
stack may have a conductance (resistivity) of less than
200 ohms per square (column 4, lines 53-57), Kuhlman is
disclosing that the resistivity of the outer layer
[third layer] may be less than 200 ohms per square.
It follows that Kuhlman teaches, inter alia, an anti-reflective
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