Appeal No. 2006-1230 Παγε 5 Application No. 10/137,586 are being relied upon. The record indicates that a copy of the translation of the entire document was sent to appellant in the communication dated July 29, 2005. From the mailing date of the translation, it would appear that the translation would have crossed in the mail with the reply brief. To preserve the integrity of the due process to which appellant is entitled, we designate our affirmance, infra, as a New Ground of Rejection in order to allow appellant the opportunity to reopen prosecution, should appellant desire to do so. The following remarks rely on this translation. Turning to Saito, we find that the semiconductor device is embodied by resin-molding a semiconductor chip (page 2). It is disclosed (page 3) that in the prior art, laser marking caused a channel with a depression shape formed on the resin surface. In the alternate embodiment of figures 3a and 3b, the reference discloses (pages 5 and 6) that the photosensitive resin film 7, which includes a colorable material, is coated on the surface of the molded resin component 1, where a character or mark is exposed and formed in a flat fashion by means of ultraviolet irradiation via a mask. From this disclosure, we find that the photosensitive resin 7 is coated on the molded resin component 1, and the character orPage: Previous 1 2 3 4 5 6 7 8 9 10 11 12 13 14 15 NextLast modified: November 3, 2007