Appeal 2006-2603
Application 10/270,486
65. A single-step anodization process for forming a uniformly thick
anodized film on a substrate, comprising applying an anodizing voltage that
has been compensated to account for an ohmic voltage loss resulting from a
flow of current through an electrolyte.
In addition to the admitted prior art found in Appellants' specification,
the Examiner relies upon the following references as evidence of
obviousness:
Galwey US 4,500,840 Feb. 19, 1985
Konuma US 5,595,638 Jan. 21, 1997
Chan US 6,096,590 Aug. 1, 2000
Yamagata US 6,200,878 B1 Mar. 13, 2001
Keigler US 6,540,899 B2 Apr. 1, 2003
Matsumura US 6,547,938 B1 Apr. 15, 2003
Higashi US 6,678,144 B2 Jan. 13, 2004
Bockris, "Modern Electrochemistry," 1, Sec. 4.3, 347-367 (Apr. 1973)
Lowenheim, "Electroplating," Ch. 2, 8-11 (Jan. 1979)
Duenas, "Use of anodic tantalum pentoxide for high-density capacitor
fabrication," Journal of Materials Science: Materials in Electronics, 10,
379-384 (1999)
Electrochemistry Dictionary – I, http://www.corrosion-doctors.org/
dictionary/Dictionary-I.htmrl
Appellants' claimed invention is directed to a process for forming an
anodized film on a substrate that is exposed to an electrolyte which
comprises applying an anodizing voltage that has been compensated to
account for the voltage lost resulting from the flow of current through the
electrolyte.
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