Appeal 2007-0496
Application 10/273,147
a chamber for storing therein an object to be processed;
a gas supply pipe for supplying a material gas to the chamber;
a light source formed outside of the chamber, the light source
providing vacuum ultraviolet light;
a transparent plate provided in the chamber, for allowing the vacuum
ultraviolet light to pass therethrough; and
a heater for heating the transparent plate, which is provided directly
on the transparent plate.
10. A CVD apparatus comprising:
a chamber for storing therein an object to be processed;
a gas supply pipe for supplying a material gas to the chamber;
a light source formed outside of the chamber, the light source
providing vacuum ultraviolet light;
a transparent plate provided in the chamber, for allowing the vacuum
ultraviolet light to pass therethrough; and
a mask member for controlling the transmitted amount of the vacuum
ultraviolet light, which is provided on the transparent plate and between said
transparent plate and said light source.
The Examiner relies upon the evidence in these references (Answer1
3):
Anderson US 5,551,982 Sep. 3, 1996
Suzuki US 5,593,608 Jan. 14, 1997
Ito US 6,072,162 Jun. 6, 2000
Lee US 6,086,679 Jul. 11, 2000
Shi US 6,284,050 Sep. 4, 2001
Appellants request review of the following grounds of rejection under
35 U.S.C. § 103(a) advanced on appeal (Br.2):
1 We refer to the second Examiner’s Answer mailed July 14, 2006, pursuant
to the Board Order entered October 27, 2005, which required certain
procedural changes in the first Answer mailed January 11, 2005.
2
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