Appeal 2007-2045
Application 10/204,670
RELEVANT FINDINGS OF FACT
1) Shih discloses a process for synthesizing one-dimensional
nanosubstances in which a membrane having a plurality of parallel
aligned through channels serves as a host material. (Col. 3, ll. 30-
33).
2) In Shih’s process, an electron cyclotron resonance chemical
vapor deposition (ECR-CVD) system is used to contact the
membrane with a microwave excited plasma of a precursor gas.
One-dimensional nanosubstances are formed in the channels of the
membrane by chemical vapor deposition of the precursor gas.
(Col. 3, ll. 33-39).
3) According to Shih, a high percentage of dissociation of the
precursor gas occurring under the ECR system provides a higher
plasma density at lower temperatures than other more conventional
processes such as rf, dc or microwave plasma enhanced chemical
vapor deposition (CVD) systems. Shih states that the advantage of
the ECR system is that a large amount of ion flux can pass through
the channels of the membrane, and nanosubstances can be
synthesized in the channels over a large area. (Col. 4, ll. 3-10).
4) Shih discloses that the carbon nitride nanosubstances can be
in the form of hollow nanotubes or solid nanofibers. (Col. 5, ll.
15-23).
4
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Last modified: September 9, 2013