Appeal No. 96-3649
Application 08/344,509
metal constituents in a stoichiometric ratio desired for said
film;
vaporizing said precursor at a selected rate;
hydrolyzing a portion of said precursor in the
vapor state to form a hydrolyzed precursor; and
reacting said hydrolyzed precursor on a substrate
to form a film containing said metal constituents in said
stoichiometric ratio.
The references of record relied upon by the examiner are:
Rothschild et al. (Rothschild) 4,888,203 Dec. 19, 1989
Purdy H1170 Apr. 6, 1993
Sladek et al. (Sladek), ?Low Temperature Metal Oxide Deposition
by Alkoxide Hydrolysis?, Journal article announcement No.
GRAI7301, published in Proceedings of the International
Conference on Chemical Vapor Deposition (3rd), Salt Lake City,
Utah, April 24-27, 1972, pages 215-231.2
Claims 1 through 6 and 23 through 29 stand rejected under 35
USC § 103 over Sladek in view of Purdy. Additionally, appealed
claims 7 through 22 stand similarly rejected under the same
section of the statute further in view of Rothschild.
We affirm.
The subject matter on appeal is directed to a method for the
chemical vapor deposition of a heterometaloxide film (e.g., a
2Only an abstract of this publication is physically present in the
record.
2
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