Appeal No. 95-3942
Application No. 08/008,976
a lithographic resist, as required by appealed claim 6. While we
appreciate that the resist of McMillan may be incidentally
exposed to some level of intensity of metastable atoms, as well
as ions and vacuum ultraviolet radiation, the examiner has not
established with factual evidence that the process of McMillan
inherently directs a beam of metastable atoms on the resist.
Based on the foregoing, the examiner's decision rejecting
the appealed claims is reversed.
REVERSED
EDWARD C. KIMLIN )
Administrative Patent Judge )
)
)
)
RICHARD E. SCHAFER ) BOARD OF PATENT
Administrative Patent Judge ) APPEALS AND
) INTERFERENCES
)
)
TERRY J. OWENS )
Administrative Patent Judge )
-4-
Page: Previous 1 2 3 4 5 Next
Last modified: November 3, 2007