Ex parte MACK et al. - Page 2




          Appeal No. 96-0096                                                          
          Application No. 08/094,794                                                  


               The subject matter on appeal relates to a process for                  
          depositing a borophosphosilicate glass on a substrate which                 
          comprises mixing tetramethylcyclotetrasiloxane and trimethyl-               
          borate together to form a first gaseous mixture, mixing                     
          trimethylphosphite and oxygen together to form a second                     
          gaseous mixture and heating the second gaseous mixture, and                 
          introducing the first and second gaseous mixtures into the                  
          reactor at different locations remote from the substrate.                   
          This appealed subject matter is adequately illustrated by                   
          independent claim 6 which reads as follows:                                 
               6.   A process for depositing a borophosphosilicate glass              
          on a substrate, comprising the steps of:                                    
               supplying an energized substrate;                                      
               supplying sources of the gases tetramethylcyclotetra-                  
          siloxane, trimethylborate, trimethylphosphite, and oxygen;                  
               mixing the tetramethylcyclotetrasiloxane and trimethyl-                
          borate together to form a first gaseous mixture;                            
               mixing the trimethylphosphite and the oxygen together to               
          form a second gaseous mixture and heating the second gaseous                
          mixture;                                                                    
               introducing the first gaseous mixture into the reactor                 
          and the second gaseous mixture into the reactor at different                
          locations remote from the substrate; and                                    



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