Appeal No. 96-1179
Application 08/190,622
withdrawn. Claims 3-6 and 9-11 have been indicated to be2
allowable by the examiner. Claim 1 is illustrative:
1. A system for sputtering material on a substrate, said
system comprising:
a chamber for establishing and confining a
plasma;
a target holder for holding a target of material
to be sputtered within said chamber;
a wafer holder for holding a wafer on which said
material is to be sputtered, said wafer being
held within said chamber;
a collimator for blocking atoms moving
relatively obliquely toward said wafer and
permitting atoms moving relatively orthogonal to
said wafer to reach said wafer, said atoms being
of said material and being dislodged from said
target by said plasma; and
drive means for moving and removing said
collimator into and out of a position between
said target and said wafer;
whereby,
when said collimator is not between said target
and said wafer, atoms with relatively oblique
trajectories and atoms with relatively
orthogonal trajectories are deposited on said
wafer, and
when said collimator is between said target and
said wafer, a greater proportion of the atoms
See page 3 of the Answer.2
2
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