Appeal No. 96-2085
Application No. 08/301,536
forming a third insulating layer overlying the second
insulating layer;
forming a fourth insulating layer overlying the third
insulating layer;
forming a first opening with vertical sidewalls over
the fuse, the first opening extending through the third and
fourth insulating layers and at least through a portion of the
second insulating layer; said first opening exposing a portion of
said second insulating layer over said fuse; said remaining
portion of said second insulating layer having a thickness in the
range of 100 to 15,000 angstroms;
forming a protective layer over the fourth insulating
layer, over at least the sidewalls of the first opening, and the
exposed portion of the second insulating layer on the bottom of
the opening; said protective layer is formed of silicon nitride
having a thickness in the range of 3000 to 20,000 angstroms; and
forming a second opening in the protective layer over
the fuse thus exposing the remaining portion of said second
insulating layer.
In addition to the admitted prior art found in appellants'
specification, the examiner relies upon the following references
as evidence of obviousness:
Takayama et al. (Takayama) 4,536,949 Aug. 27, 1985
Udo et al. (Udo) 4,628,590 Dec. 16, 1986
Motonami et al. (Motonami) 5,241,212 Aug. 31, 1993
Appellants' claimed invention is directed to a method of
forming a silicon nitride protective layer over the sidewalls of
a window in insulation layers and over a fuse before the fuse is
cut by a laser. An opening is formed in the protective layer to
allow the laser to cut the fuse. According to appellants, the
-3-
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