Appeal No. 95-3455
Application 07/945,902
20 3
tungsten silicide layer being 1 x 10 atom/cm or
less, and
(d) patterning the
polysilicon layer and the tungsten silicide layer by
etching to make a floating gate.
THE PRIOR ART
The references of record which are being relied on by the
examiner as evidence of obviousness are : 2
Hillman et al. (Hillman) 4,966,869 Oct.
30, 1990
Itoh 5,120,673 Jun.
9, 19923
Mitchell 5,156,990 Oct. 20, 19924
Kume et al. (Kume) 5,188,976 Feb. 23, 19935
A reference cited by appellants as evidence of non-
In his Answer, the examiner has withdrawn his reliance on the disclosure of the2
U.S. patent to Wada.
Application filed on January 25, 1991.3
A division of U.S. Application 07/889,454, filed on July 23, 1986, now U.S.4
Patent Number 4,979,005 issued December 18, 1990.
Application filed on July 9, 1991.5
3
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