Appeal No. 95-4115 Page 2
Application No. 07/932,714
BACKGROUND
The appellant's invention relates to a method of forming
a phase shifting reticle. An understanding of the invention
can be derived from a reading of exemplary claim 12, which has
been reproduced below.
12. A method of fabricating a phase shifter of a reticle
comprising the steps of:
forming both light shielding layers and apertures on a
substrate of an optically transparent material;
forming a thin film of silicon dioxide by a chemical
vapor deposition on said light shielding layers and on parts
of a surface of said substrate which are exposed through said
apertures;
applying a photo-resist film over an entire surface of
said silicon dioxide film for a subsequent patterning so that
said apertures of said light shielding layers are
alternatively overlaid by remaining portions of said photo-
resist film and its apertures;
selectively forming a phase shifter of silicon dioxide on
a part of a surface of said silicon dioxide thin film exposed
through said apertures of said photo-resist film, said
selective forming being by a liquid phase epitaxial growth;
and
removing said remaining photo-resist film.
The prior art references of record relied upon by the
examiner in rejecting the appealed claims are:
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