Appeal No. 96-1583
Application 08/066,618
and essentially forms the active base region 64. Considering
both the claimed invention and the Zdebel process as a whole,
it is the low energy implantation that forms the active base
region of the claimed invention, whereas the active base
region of Zdebel is formed by the higher energy implantation.
In conclusion, based on the foregoing, the examiner's
decision rejecting the appealed claims is reversed.
REVERSED
EDWARD C. KIMLIN )
Administrative Patent Judge )
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) BOARD OF PATENT
JOHN D. SMITH ) APPEALS AND
Administrative Patent Judge ) INTERFERENCES
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CAROL A. SPIEGEL )
Administrative Patent Judge )
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