Appeal No. 96-2261
Application 08/026,669
THE INVENTION
Appellant’s claimed invention is directed toward an
automated method for washing objects wherein the objects are
exposed to ultraviolet radiation, resist developer and a
surfactant solution. Appellant states that the method is
capable of removing resist flakes from semiconductor wafer
cassettes and carriers without the use of solvents
(specification, page 1). Claim 32 is illustrative and reads
as follows:
32. A method for automated washing of objects,
comprising
the following steps:
(a) placing the objects to be washed in a chamber;
(b) exposing the objects to ultraviolet radiation;
(c) applying resist developer fluid to the objects;
(d) rinsing the resist developer;
(e) applying surfactant solution to the objects;
(f) rinsing the surfactant solution from the objects;
and
blowing air into the chamber to dry the objects.
THE REFERENCES
Bardina et al. (Bardina) 4,560,417 Dec. 24, 1985
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