Ex parte JOHNSTON et al. - Page 2




          Appeal No. 1997-0988                                                        
          Application No. 08/199,910                                                  


                                  DECISION ON APPEAL                                  
               This is a decision on appeal from the examiner's final                 
          rejection of claims 26 through 31, 33, 34, 36 through 44, 46,               
          47, 49 and 52, which are all of the claims pending in this                  
          application.  In the Appeal Brief (page 3), appellants state                
          that they do not appeal the rejection of claim 49.                          
          Accordingly, only claims 26 through 31, 33, 34, 36 through 44,              
          46, 47 and 52 are before us on appeal.                                      
               The appellants' invention relates to semi-insulating                   
          doped indium phosphide (InP) and devices made therefrom.                    
          Claim 52 is illustrative of the claimed invention, and it                   
          reads as follows:                                                           
               52. An optoelectronic device or a laser device, said                   
          device comprising a substrate, first and second active regions              
          of said device, and a region of semi-insulating indium                      
          phosphide based material formed on said substrate and                       
          electrically isolating said first active region from said                   
          active region wherein said region of semi-insulating indium                 
          phosphide based material is formed by the process that                      
          comprises the steps of contacting said substrate with a                     
          deposition gas stream characterized in that said substrate has              
          a resistivity less than 10  ohm-cm, said semi-insulating3                                                 
          region has a resistivity of at least 10 ohm-cm, said semi-6                                    
          insulating region is epitaxial to said substrate and said                   
          semi-insulating region is formed by introducing a dopant                    
          precursor comprising a composition chosen from the groups                   
          consisting of ferrocene based compositions and iron                         
          pentacarbonyl based compositions into said deposition gas                   
          stream wherein said deposition gas stream is produced by                    
          combining entities including an organo-indium compound and a                
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