Appeal No. 1997-0027
Application No. 08/117,443
given chamber dimension since they are said to be applicable
to conventional sputtering devices involving a variety of
target materials and a variety of vacuum chamber sizes. See
page 5. In any event, the power supplies described in Mashiro
are embraced by the claimed power supplies since the claimed
processing and process initiation voltages produced in the
claimed power supplies include those actual voltages produced
by the power supplies described in Mashiro.4
Appellant argues that Mashiro does not teach or suggest
the claimed primary and secondary power supplies for applying
a processing voltage and a process initiation voltage,
respectively. See Brief, pages 10-15. In other words,
appellant takes the position that the functional limitations
of his claim distinguish it over Mashiro. However, when, as
here, the power supplies of Mashiro are capable of operating
or performing the same function as the claimed power supplies
4The claimed processing and process initiation voltages
embrace any and all actual voltages since they are dependent
on, inter alia, target materials, process gas and pressure,
and chamber geometry. See specification, page 3.
7
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