Ex parte JIMENEZ et al. - Page 2




          Appeal No. 1997-2691                                                        
          Application 08/496,849                                                      


          diode infrared detector with a voltage tunable cutoff                       
          wavelength which is obtained by inserting a SiGe layer between              
          the metal silicide and the Si substrate.  Appellants disclose               
          on page 5 of the specification that Fig. 1 shows the current                
          state of the art for metal photoemissive devices which do not               
          have a SiGe layer between the metal silicide and the Si                     
          substrate.  Appellants disclose on page 8 of the specification              
          that Fig. 3 shows the Appellants' invention having the SiGe                 
          layer between the metal silicide and the Si substrate.                      
               Independent claim 1 presented in the application is                    
          reproducted as follows:                                                     
               1.  A Schottky barrier infrared photovoltaic detector;                 
          which outputs a detection signal which is adjusted by an                    
          externally applied voltage and which comprising:                            
               a silicon substrate having a first and second surface;                 
               a silicide layer placed on the first surface of the                    
          silicon substrate to form a detector which has a barrier                    
          height and which operates in an infrared portion of an                      
          electromagnetic spectrum by internal photoemission of holes                 
          over an electrical barrier, said detector outputting said                   
          detection signal in response to said internal photoemission;                
               a guard ring implanted in said silicon substrate, said                 
          guard ring surrounding the periphery of said silicide layer to              
          block surface currents formed on said substrate and to                      
          eliminate edge effects;                                                     


                                          2                                           





Page:  Previous  1  2  3  4  5  6  7  8  9  10  11  12  13  Next 

Last modified: November 3, 2007