Appeal No. 1997-3731
Application No. 08/152,089
unwanted etching. According to appellant, as a result of
etching, materials are deposited on the quartz cover, and it
has to be cleaned about every 50 hours.
Independent claim 1 is drawn to a dry etching apparatus
that comprises, inter alia, the feature of a second electrode
means with an aperture comprising a metal disc and a hollow,
tubular connection member connecting the metal disc to the
wall of a reaction chamber, with the tubular connection member
having a wall that surrounds a void, and the feature of a
cover member mounted detachably on the second electrode means,
the cover member having an aperture in alignment with the
aperture of the second electrode means, such that an optical
beam passes successively through a transparent window in the
wall of the reaction chamber, the void and the aperture on the
second electrode means, and further through the aperture on
the cover member.
We turn now to the evidence of obviousness relied upon by
the examiner.
The teaching of Roland (Fig. 1) is somewhat akin to the
known apparatus described in the “BACKGROUND OF THE INVENTION”
section of appellant’s specification, but lacks the teaching
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