Appeal No. 2000-0034
Application 08/473,634
restricting the flow of the chemical compound into a
portion of the reaction chamber so that the flow is introduced
towards the member and the chemical compound decomposes to
form an end product and wherein no substantial deposition of
the end product takes place on the member during decomposition
of the chemical compound.
34. A method of decomposing a compound comprising the
steps of:
providing an energy source which generates energy;
providing a reaction chamber;
providing a member positioned in the reaction chamber;
heating the member with the energy of the energy source;
and
providing a flow of a chemical compound into the reaction
chamber through a conduit, the conduit extending into a
portion of the reaction chamber, wherein the flow of the
chemical compound is generated as a result of processing a
semiconductor wafer; and wherein the flow of the chemical
compound exits from an exit end of the conduit such that the
flow is introduced towards the member and wherein the exit end
of the conduit is positioned at most a distance away from the
member equal to 2 times the distance away from the member
where a flow rate of the chemical compound exiting out of the
exit end of the conduit does not backflow.
THE REFERENCES
Akashi et al. (Akashi) 4,386,258 May 31,
1983
Mundt 5,137,701 Aug. 11,
3
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