Ex Parte HASHIZUME et al - Page 5




Appeal No. 2000-0710                                                                  
Serial No. 08/788,959                                                                 
                                                                                     
          this language is intended to mean that the edges of piezoelectric           
          layer PZ and upper electrode UE are in alignment, unlike in                 
          conventional ink jet recording heads wherein a pattern shift                
          or misalignment exists between the PZT layer and the upper                  
          electrode.  The alignment between layers in appellants’ device is           
          attributed to the fact that the two layers of the recording head            
          in question are formed by a dry etching system to etch layers 4             
          and 5 (Figs. 6 and 7) in batch, that is, in the same step.  Such            
          being the case, we do not agree with the examiner that the above            
          claim recitation does not further limit the final structure of              
          the claimed invention.                                                      
               At page 10, the translated Fujii reference teaches etching             
          to form the PZT element 4.  However, the examiner has not                   
          established that misalignment of layer edges was a problem                  
          recognized in the prior art, and Fujii does not teach                       
          simultaneous etching of a PZT layer and an upper conductive layer           
          to produce a PZT layer and an upper electrode layer whose edges             
          are aligned, that is, without a pattern shift between the piezo-            
          electric thin film and the upper electrode as required by the               
          claims.  Accordingly, the rejection of claims 1, 4 and 22 as                
          anticipated by Fujii cannot be sustained.3                                  

                                                                                     
          3. We note that at page 5, lines 1 and 2, Rittberg teaches                  
          simultaneous etching of a PZT layer and an upper conductive layer. The      
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