Appeal No. 1997-3051
Application No. 08/473,963
BACKGROUND
The invention is directed to a photosensitive composition comprising an
alkali-soluble polymer, a compound which generates an acid when exposed to chemical
radiation, and an acid-decomposable compound. The acid-decomposable compound has (i)
at least one substituent which is an ester moiety, a tetrahydropyranyl ether group, an
alkylcarbonate group or a silyl ether group, which substituent is decomposed by reaction
with acid which is generated when said compound is exposed to chemical radiation, and (ii)
at least one group which is converted into a -COO- or -S0 - group by reaction with an
3
alkaline solution after said decomposition of said acid-decomposable compound. Claim 33
which is representative of the invention is reproduced below:
33. A photosensitive composition comprising:
an alkali-soluble polymer;
a compound which generates an acid when exposed to chemical
radiation; and
an acid-decomposable compound having (a) at least one substituent
which is an ester moiety, a tetrahydropyranyl ether group, an alkylcarbonate
group or a silyl ether group, which substituent is decomposed by reaction
with acid which is generated when said compound is exposed to chemical
radiation, and (b) at least one group which is converted into a -COO- or -S0 -
3
group by reaction with an alkaline solution after said decomposition of said
acid-decomposable compound.
As evidence of obviousness, the Examiner relies on the following references:
-2-
Page: Previous 1 2 3 4 5 6 7 8 9 10 Next
Last modified: November 3, 2007