Appeal No. 1997-3051
Application No. 08/473,963
Uenishi ‘389 and ‘582 disclose positive type photosensitive compositions
comprising a binder and a photosensitive dissolution inhibitor. The dissolution inhibitor
contains a multi-aromatic ring compound, which contains a cyclic ring system constituted
of heteroatoms and quinone diazide radicals. (‘389, column 2 line 36 to column 8, line
24; ‘582 column 2, line 34 to column 3, line 68). Uenishi discloses quinone diazide
dissolution inhibitor compounds produce an alkali-soluble substance when irradiated with
light to undergo decomposition. (‘389, column 1 lines 30-35; ‘582 column 1, lines 50-
57). Uenishi does not disclose the presence of a compound which forms an acid upon
exposure to radiation or that the dissolution inhibitor contains groups which are cleaved by
an acid.
According to the examiner “[i]t would have been obvious to substitute the
acid-decomposable compound of Uenishi et al. [sic, ‘389 or ‘582] into the compositions
[sic, of] Crivello et al., Nguyen-Kim et al., or Elsaesser et al. One of ordinary skill in the
art would have been motivated to make this substitution because of the teaching of Uenishi
et al. that these compounds provide resists which are capable of forming a pattern with
vertical side walls, have broad development
latitude and provide resist images with excellent heat resistance.” (Examiner’s Answer,
page 8, third paragraph).
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