Appeal No. 1997-3312
Application No. 08/183,787
Kinoshita 4,842,707 Jun.
27, 1989
Nakazato et al. (Nakazato) 4,631,106 Dec. 23,
1986
Ukai et al. (Ukai) 4,816,638 Mar. 28,
1989
Sekine et al. (Sekine) 4,838,978 Jun. 13,
1989
The appealed claims stand rejected under 35 U.S.C. § 103
as unpatentable over Kinoshita in view of either of Nakazato,
Ukai, or Sekine.
We cannot sustain the stated rejection.
The subject matter on appeal is directed to a magnetron
plasma process apparatus for use in manufacturing
semiconductor devices, e.g., for plasma etching of
semiconductor wafers. The claimed apparatus includes a
process chamber having a transfer port for an object such as a
semiconductor wafer to be processed. The chamber includes an
upper electrode and a lower electrode which are parallel to
each other. Further the claimed apparatus provides for a
magnetic field generating section which comprises a pair of
permanent magnets. The magnets are located outside the
chamber and are rotatable in a horizontal plane. Since the
permanent magnets are located so as to surround or sandwich
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